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Oxford Vacuum Science
Bench-top high vacuum and thin film products |
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A real alternative to eb For many applications VapourPhase Ω offers a real, low cost alternative to electron beam technology (eb). In essence, eb and resisitve evaporation are similar:- the evaporant is heated from its solid state to its vapour state (hence "VapourPhase") and forms a mist which condenses out on the substrate to form a thin film. The difference is in the method of applying the heat. Whereas eb directs a stream of highly energentic electrons directly onto the evaporant, resistive evaporation uses heat conducted from a Joule heated element containing the evaporant. But Joule heating tends to be inefficient and unfocussed:- resistive and radiative heating of proximate surfaces causes contamination and instability. VapourPhase Ω is a high power, thermally stable source mounting system which negates these issues to give clean, controllable evaporation for a fraction of the price of eb. Whilst some materials, notably refractory metals, require direct heating because of their extreme vapour points, for most others VapourPhase Ω can offer a real, low cost alternative to eb. To discuss your thin film requirments, contact technology@oxford-vacuum.com.
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Oxford Vacuum Science Ltd tel: +44 (0) 1869 349161 |
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