Oxford Vacuum Science Limited  
Bench-top high vacuum and thin film products    
 

NanoSphere

Bench-top High Vacuum Platform

Exceptional performance through
uncompromising design

  • All stainless steel "bell-jar" vacuum chamber
  • 16m3/hr roughing pump for rapid evacuation 1
  • 240l/s wide-range turbo for high vacuum
  • Atmosphere to 1x10-5mbar in 5 minutes 2
  • Low 10-6mbar range in less than hour 2
  • Low 10-7mbar range ultimate pressure 2
  • Max. continuous process pressure >10-2mbar

The NanoSphere bench-top high vacuum platform is the ideal base for high vacuum research and light industrial applications. Its compact, modular design allows for a tidy, efficient workspace, with a robust industrial PC to control and monitor the vacuum process and processes installed within the chamber. Data can be recorded via serial interface or analogue input and then manipulated via OpenOffice software.

Easy to use

NanoSphere evacuates automatically when the top chamber is closed and locked, in a single action, and then vents when unlocked. When fully vented the top chamber is released and opened with a light, spring-assisted action for fast, easy access inside the chamber.

Higher functionality is available through NanoSphere's industrial PC control. The LOAD function quickly and smoothly reduces the turbo speed ready for high load applications such as magnetron sputter deposition or PECVD3, and fills a vacuum service ring, used for differential pumping of the main chamber seal under PUMP, with process gas for direct,local access to process components.

The STORE function allows the system to be safely shut-down from any condition, making it power failure safe too. From PUMP or LOAD the chamber is partially vented, keeping it under clean, dry conditions for rapid re-evacuation, whilst maintaining the turbo-pump bearings at a safe storage pressure.

NanoSphere bench-top deposition system suite

The NanoSphere high vacuum platform forms the core of Oxford Vacuum Science's bench-top deposition system suite, which combines high performance deposition components with flexibility and ease of access for research and development and light industrial thin film deposition applications.

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Bench-top High Vacuum Platform

Features and options*

  • High speed primary vacuum pump and variable speed wide-range turbo for rapid evacuation to high vacuum and high gas load applications
  • Industrial PC control with full data logging
  • Safe, partial vent STORE command for system shut-down (default setting on loss of power )
  • Flexible jigging system for process component / substrate mounting*
  • Flange adaptor for glass bell-jar*
  • Differentially pumped main flange doubles as process gas distribution ring (regulated to 1 atmosphere)4

Compatibility and expandability

  • Main flange DN 250 ISO-K and DN 320 ISO-K compatible 4
  • Flanges: 3 off DN100 ISO-K, 1 off DN 25KF and 2 off DN 16KF 5,6
  • 5 off differential pumping / process gas distribution ports 4
  • 8 off serial communication ports7 with 24Vdc power, 4+28 off USB ports and 7 off analogue inputs available for device communication

Top chamber

Additional features

  • Auto PUMP and auto VENT on locking / unlocking top chamber lid
  • Light, spring assisted opening action on top chamber lid
  • All stainless steel bell-jar type chamber with 6 off DN 100 ISO-K wide-angle viewing ports

Accessory collar

Vacuum flanges and feedthroughs6

  • 3 off DN 63 ISO-F
  • 1 off DN 25KF
  • DN 320 ISO-K compatible
  • 5 off DN 40KF
  • 2 off DN 16KF
Vacuum platform only Short chamber Full chamber including
accessory collar		 Vacuum platform footprint
(roughing pump not shown)

For more information and latest news on availability, please contact technology@oxford-vacuum.com.

1 10m3/hr dry pump version also available. Recommended for clean, gas load applications (eg. magnetron sputtering)
2 Assuming clean, dry vacuum chamber conditions
3 Please contact Oxford Vacuum Science to discuss compatibility with non-inert gases
4 Requires top chamber, accessory collar or bell-jar adaptor flange:- Not available when used directly with standard DN 250 ISO-K or DN 320 ISO-K flange
5 + 1 off DN 100 ISO-K used by turbo pump, 1 off DN 25KF used by combined Penning / Pirani gauge
6 Contact OVS to discuss UHV (CF-F) flange options
7 Factory configurable to RS 232, RS 422 or RS 485. Default setting 4 off RS 232 + 4 off RS 485 (min. 1 off RS 232)
8 4 off rear mounted, 2 off front mounted. USB ports allocated to mouse, keyboard etc. where necessary

printable (pdf) version
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Oxford Vacuum Science Limited
39 South Street
Middle Barton
Oxfordshire
OX7 7BU UK

tel: +44 (0) 1869 349161
fax: +44 (0) 1869 349157
 OVS@oxford-vacuum.com
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